10k rpm laboratory PP spin coater with SUS shell for wafer upto 8-inch

The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in the fields of photoresist spin coating, biological medium production, and sol-gel method to produce polymer films. After being miniaturized, this model of spin coater adopts stainless steel structure, and PP chamber with transparent glass cover, which is beautiful and firm. The instrument adopts advanced precision motor, and the rotation speed can reach 10,000 rpm, which effectively guarantees the uniformity of the film formation. In addition, the instrument is controlled by a touch screen, which can preset a uniform curve, which greatly simplifies the use process and reduces the learning cost, which is very suitable for laboratory purchase.