laboratory PC control DC magnetron sputtering coating machine

Single target DC magnetron sputtering coateris a cost-effective vacuum PVD coating equipment independently developed by our company,which can be used for preparing single-layer ferroelectric thin films, conductive films, alloy films, and the like. The magnetron target head can be selected from 1 inch 2 inches 3 inches. The device is equipped with 1500W high power DC power supply, which can be used for high energy metal sputter coating. The coating machine has a two-channel high precision mass flow meter. The instrument is equipped with advanced turbo molecular pump group, and ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.