vacuum RF magnetron sputtering coater for dielectric optical oxide films

Single-target RF magnetron sputtering coater is a cost-effectivevacuum PVD coating equipment independently developed by our company,which can be used to prepare single-layer ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. The magnetron target head has 1 inch 2 inches and 3 inches to choose from. The device is equipped with 300W RF power supply, which can be used for sputtering of non-metal film and optical film. The coating machine is equipped with two-channel high-precision mass flowmeter. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.