vacuum PVD DC 2-target magnetron co-sputtering coater

Dual-target DC magnetron sputtering coateris a cost-effective vacuum PVD coating equipment independently developed by our company.,which can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, and the like. There are 1-inch or 2-inch magnetron targets for you to choose. The device is equipped with two 500W DC power supply. The DC power supply can be used for the preparation of metal film. The two targets can meet the needs of multi-layer or multiple coatings. The coating machine is equipped with two-channel high-precision mass flowmeter. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.