DC RF magnetron sputtering PVD coater with film thickness gauge

Dual-target RF magnetron sputtering coateris a cost-effective vacuum PVD coating equipment independently developed by our company.This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated. The device is equipped with 300W RF power supply and 500W DC power supply. The DC power supply can be used for the preparation of metal film, and the RF power supply can be used for the preparation of non-metal films. The two targets can meet the needs of multi-layer coatings. The coating machine has a two-channel high precision mass flow meter. The instrument is equipped with advanced turbo molecular pump group, and ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. In addition, this machine is equipped with two high precision film thickness gauges, which can meet the film thickness detection requirements during the coating process. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.