pecvd system

Small intelligent type PECVD,PECVD-S-150A Main features： Small size,full function，Suitable for laboratory sample preparation and plasma treatment. Set vacuum unit, gas supply system, RF source, automatic propulsion, heating furnace in on.All the controls are integrated into the touch screen control interface to make the device more intelligent and easy to operate. Adjustable power range 0-150W; adjustable temperature range: 100-1200 degrees; adjustable sputtering region: 0-1000mm; application: metal film, ceramic film, composite film, continuous growth of various films, etc. Expandable plasma cleaning etching and other functions. Furnace Max. temp 1200°C Heating zone length 440mm Constant zone length 200mm Temp. control PID automatic control with 30 steps programmable，Operation interface is 7 "industrial control computer Tube size Ø 25，,Ø50（optional） PE source: Signal frequency 13.56 MHz±0.005% Power output range 0-150W Gas supply system Accurate control of gas flow with high precision mass Flowmeter Mass Flowmeter reference range（N2) 100sccm、200sccm 500sccm（optional） Accuracy ±1.5% Repeatability precision ±0.2% Working pressure difference range 0.1～0.5 MPa Max. pressure 3MPa Vacuum unit KF25 series bellows and manual stopper valves vacuum 10-1 pa The value can be displayed intuitively by the digital display vacuum tester